Evolution of microstructure and phase in amorphous, protocrystalline, and microcrystalline silicon studied by real time spectroscopic ellipsometry

38 PAGES (16033 WORDS) Material Science Article/Essay

Real time spectroscopic ellipsometry has been applied to develop deposition phase diagrams that can guide the fabrication of hydrogenated silicon (Si: H) thin films at low temperatures (< 300° C) for highest performance electronic devices such as solar cells. The simplest phase diagrams incorporate a single transition from the amorphous growth regime to the mixed-phase (amorphous+ microcrystalline) growth regime versus accumulated film thickness [the a→(a+ μc) transition].